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Manual Precision Alignment Double-sided Exposure Machine
TT06D
Manual precision alignment double-sided exposure machine
Exposure light source wavelength: NUV (including 365nm, 405nm, 435nm)
Light source parallel half angle: 1.5~2.5 degrees (depending on the aperture)
■ Align the imaging system:
The use of variable magnification lens is convenient for alignment operation, and the standard total magnification is 50X-300X
CCD camera imaging system
■ production can:
Proximity exposure is best set at 3~5um according to the distance between wafer and mask.
The output varies according to the alignment accuracy and exposure time. The fastest can be up to three exposures per minute.
■ External Dimensions Weight:
W: 1200 x L. 900 x H. 1800mm
■ heavy quantity:
Weight about 160kg
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