■ Equipment Specifications :

• Exposure lamp source, photomask line width replication capability, I-line positive
  photoresist 1um thickness, hard contact 1um~2um, proximity.
   

■ Alignment Imaging System :

• Automatic alignment capability, recognizes geometrically clear align key within
  5um

 

■ Productivity :

• Alignment process, exposure time 3 seconds, 250~300 pieces per hour mechanical
  capacity (without considering material variability rejection).

• No alignment only exposure process, exposure time 3 seconds, 280~360 pieces per
  hour mechanical capacity (without considering material variability rejection).
   

■ External dimensions:

• Width : 1900 x depth 1600 x height 2400mm

 

■ Weight :

• Weight about 1700kg

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