Manual double-sided exposure machine

Machine name model: TT06D

■ Exposure light source:

• Wavelength: NUV (including 365nm, 405nm, 435nm)

• ​ Parallel half-angle of light source: 1.5~2.5 degrees (depending on the aperture of the light)

■ Luminous flux density:

• (Mw cm-2): 7-25mW/cm²

• ​ Parallel angle: ±2.5˚

■ production   can:

• The best image resolution of vacuum contact exposure can reach within 1um (positive photoresist thickness is 1um)

• Proximity exposure is best set at 3~5um according to the distance between wafer and mask

• Wavelength: NUV (including 365nm, 405nm, 435nm)

• ​ Parallel half-angle of light source: 1.5~2.5 degrees (depending on the aperture of the light)

■ External Dimensions Weight:

• W: 1600  x L. 900 x H. 1250 mm

■ heavy   quantity:

• Weight about 160kg

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