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Manual Precision Alignment Single-sided Exposure Machine
TT06S
Manual precision alignment single-sided exposure machine
Exposure lamp source, wavelength: NUV (including 365nm,
405nm, 435nm)
Light source parallel half-angle: 1.5~2.5 degrees
(according to the light outlet diameter)
■ Alignment Imaging System :
-
Adopt variable magnification lens for easy alignment operation, standard
total magnification 50X-300X. -
CCD camera image system
■ Productivity :
-
Proximity exposure is best set at 3~5um depending on the distance between
the wafer and the photomask. -
The output varies depending on the alignment accuracy and exposure time,
and can be as fast as three films per minute.
■ External dimensions:
-
W:1200 x L. 900 x H. 1800mm
■ Weight :
-
Weight about 130kg

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