Manual Precision Alignment Single-sided Exposure Machine
Manual precision alignment single-sided exposure machine
Exposure lamp source, wavelength: NUV (including 365nm,
Light source parallel half-angle: 1.5~2.5 degrees
(according to the light outlet diameter)
■ Alignment Imaging System :
Adopt variable magnification lens for easy alignment operation, standard
total magnification 50X-300X.
CCD camera image system
■ Productivity :
Proximity exposure is best set at 3~5um depending on the distance between
the wafer and the photomask.
The output varies depending on the alignment accuracy and exposure time,
and can be as fast as three films per minute.
■ External dimensions:
W:1200 x L. 900 x H. 1800mm
■ Weight :
Weight about 130kg