■ Alignment Imaging System :

• Adopt variable magnification lens for easy alignment operation, standard
  total magnification 50X-300X.

• CCD camera image system

 

■ Productivity :

• Proximity exposure is best set at 3~5um depending on the distance between
  the wafer and the photomask.

• The output varies depending on the alignment accuracy and exposure time,
  and can be as fast as three films per minute.

 

■ External dimensions:

• W:1200 x L. 900 x H. 1800mm

 

■ Weight :

• Weight about 130kg

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