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Manual Precision Alignment Single-sided Exposure Machine


Manual precision alignment single-sided exposure machine

Exposure lamp source, wavelength: NUV (including 365nm,
405nm, 435nm)

Light source parallel half-angle: 1.5~2.5 degrees
(according to the light outlet diameter)

■ Alignment Imaging System :

  • Adopt variable magnification lens for easy alignment operation, standard
    total magnification 50X-300X.

  • CCD camera image system


■ Productivity :

  • Proximity exposure is best set at 3~5um depending on the distance between
    the wafer and the photomask.

  • The output varies depending on the alignment accuracy and exposure time,
    and can be as fast as three films per minute.


■ External dimensions:

  • W:1200 x L. 900 x H. 1800mm


■ Weight :

  • Weight about 130kg

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