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Manual Precision Alignment Single-sided Exposure Machine
TT06S
Manual precision alignment single-side exposure machine
Exposure light source, wavelength: NUV (including 365nm, 405nm, 435nm)
Parallel half-angle of light source: 1.5~2.5 degrees (depending on the aperture of the light)
■ Align the imaging system:
The use of variable magnification lens is convenient for alignment operation, and the standard total magnification is 50X-300X
CCD camera imaging system
■ production can:
Proximity exposure is best set at 3~5um according to the distance between wafer and mask.
The output varies according to the alignment accuracy and exposure time, and the fastest can be up to three exposures per minute
■ External Dimensions Weight:
W: 1200 x L. 900 x H. 1800mm
■ heavy quantity:
Weight about 130kg
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