Exposure Machine Series
Consistent Machine Series-Fully Automatic Exposure Machine
Auto Exposurer 3", 4", 5", 6" 300-CC This equipment is a photomask alignment exposure machine used in semiconductor lithography process.
Fully automatic single-sided exposure machine
Auto Exposurer 3", 4", 5", 6" 300-CC This equipment is a photomask alignment exposure machine used in semiconductor lithography process.
Fully automatic double-sided exposure machine
I-line positive photoresist 1um thickness, hard contact 1um~2um, proximity 3um~5um
Semi-automatic single-sided exposure machine
Exposure time 3 seconds, mechanical capacity of 250~300 pieces per hour (regardless of material variation
Semi-automatic double-sided exposure machine
I-line positive photoresist 1um thickness, hard contact 1um~2um, proximity
Manual precision alignment single-side exposure machine
The use of variable magnification lens is convenient for alignment operation, and the standard total magnification is 50X-300X
Manual precision alignment double-sided exposure machine
The use of variable magnification lens is convenient for alignment operation, and the standard total magnification is 50X-300X
Manual single-sided exposure machine
1000W ultra-high pressure mercury lamp (applicable model is ARC 1000W/D)
Manual double-sided exposure machine
The best vacuum contact exposure pattern resolution can reach within 1um (positive photoresist thickness is 1um)
Two-stand Exposure Machine - Manual CCD Alignment System
The use of variable magnification lens is convenient for alignment operation, and the standard total magnification is 50X-300X
LED exposure machine
The intensity of the light source varies according to the selected wavelength and the size and shape of the beam.
Single-sided exposure suction cup
3-point ball mechanism, rolling operation can easily slide and align the photomask
Double-sided exposure suction cup
There are 6 adjustment screws on the side, which can easily align the upper and lower masks