Exposure Machine Series

Auto Exposurer 3", 4", 5", 6" 300-CC This equipment is a photomask alignment exposure machine used in semiconductor lithography process.

Auto Exposurer 3", 4", 5", 6" 300-CC This equipment is a photomask alignment exposure machine used in semiconductor lithography process.

I-line positive photoresist 1um thickness, hard contact 1um~2um, proximity 3um~5um

Exposure time 3 seconds, mechanical capacity of 250~300 pieces per hour (regardless of material variation

I-line positive photoresist 1um thickness, hard contact 1um~2um, proximity

Using variable magnification lens to facilitate alignment operation, standard total magnification 50X-300X

Using variable magnification lens to facilitate alignment operation, standard total magnification 50X-300X

1000W ultra-high pressure mercury lamp (applicable model is ARC 1000W/D)

The best vacuum contact exposure pattern resolution is within 1um (positive photoresist thickness is 1um)

Using variable magnification lens to facilitate alignment operation, standard total magnification 50X-300X

The intensity of the light source varies according to the selected wavelength and beam size and shape.

3-point ball mechanism, rolling operation can easily slide and align the photomask

There are 6 adjustment screws on the side, which can easily align the upper and lower masks