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Manual Double Exposure Machine
TT06D
Manual double-sided exposure machine
Machine name model: TT06D
■ Exposure light source:
Wavelength: NUV (including 365nm, 405nm, 435nm)
Parallel half-angle of light source: 1.5~2.5 degrees (depending on the aperture of the light)
■ Luminous flux density:
(Mw cm-2): 7-25mW/cm²
Parallel angle: ±2.5˚
■ production can:
The best image resolution of vacuum contact exposure can reach within 1um (positive photoresist thickness is 1um)
Proximity exposure is best set at 3~5um according to the distance between wafer and mask
Wavelength: NUV (including 365nm, 405nm, 435nm)
Parallel half-angle of light source: 1.5~2.5 degrees (depending on the aperture of the light)
■ External Dimensions Weight:
W: 1600 x L. 900 x H. 1250 mm
■ heavy quantity:
Weight about 160kg
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