top of page
Uniform machine_Automatic exposure machine
AEP65-1000-300II
Fully automatic single-sided exposure machine
Machine Name Model: Auto Exposurer 3", 4", 5", 6" 300-CC
This machine is a mask alignment exposer for semiconductor
microfilming process.
Function : 1:1 duplication of the photomask pattern to the wafer surface photoresist film by UV parallel light source.
■ Exposure Lamp Source :
-
Photomask line width replication capability, I-line positive
photoresist 1um thickness, hard contact 1um~2um, proximity
3um~5um.
■ Alignment Imaging System :
-
Automatic alignment capability, recognizes geometrically
clear alignment keys within 5um.
■ Productivity :
-
Alignment process, exposure time of 3 seconds, mechanical
capacity of 250~300 sheets per hour (without considering material
variability rejection). -
Non-alignment only exposure process, exposure time of 3 seconds,
mechanical capacity of 280~360 pieces per hour (without considering
material variability rejection).
■ External dimensions :
-
W: 1542 x L: 1500 x H: 2400mm
■ Weight :
-
Weight about 1600kg
bottom of page