Uniform machine_Automatic exposure machine

AEP65-1000-300II

Fully automatic single-sided exposure machine

Machine Name Model: Auto Exposurer 3", 4", 5", 6" 300-CC
This machine is a mask alignment exposer for semiconductor
microfilming process.

Function : 1:1 duplication of the photomask pattern to the wafer surface photoresist film by UV parallel light source.

■ Exposure Lamp Source :

  • Photomask line width replication capability, I-line positive
    photoresist 1um thickness, hard contact 1um~2um, proximity
    3um~5um.

     

■ Alignment Imaging System :

  • Automatic alignment capability, recognizes geometrically
    clear alignment keys within 5um.
     

■ Productivity :

  • Alignment process, exposure time of 3 seconds, mechanical
    capacity of 250~300 sheets per hour (without considering material
    variability rejection).

  • Non-alignment only exposure process, exposure time of 3 seconds,
    mechanical capacity of 280~360 pieces per hour (without considering
    material variability rejection).

■ External dimensions :

  • W: 1542 x L: 1500 x H: 2400mm
       

■ Weight :

  • Weight about 1600kg

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